芯(xin)片(pian)(pian)流片(pian)(pian)的制造過程一(yi)(yi)(yi)般包括(kuo)以(yi)下步(bu)(bu)驟：1.制備晶(jing)圓(yuan)(yuan)。芯(xin)片(pian)(pian)的制造需(xu)要在(zai)一(yi)(yi)(yi)塊圓(yuan)(yuan)形的硅基(ji)片(pian)(pian)上(shang)(shang)進(jin)(jin)行，這個基(ji)片(pian)(pian)一(yi)(yi)(yi)般稱為晶(jing)圓(yuan)(yuan)。制備晶(jing)圓(yuan)(yuan)的過程包括(kuo)清洗(xi)、拋光、化(hua)學蝕(shi)刻(ke)等步(bu)(bu)驟。這個步(bu)(bu)驟的目的是確保晶(jing)圓(yuan)(yuan)表面的平整(zheng)度和純度，為后續(xu)的工作(zuo)打好基(ji)礎(chu)。2.運(yun)用(yong)(yong)光刻(ke)技術(shu)(shu)打印電路圖(tu)案。光刻(ke)是一(yi)(yi)(yi)種(zhong)通過曝光和蝕(shi)刻(ke)來(lai)(lai)制造芯(xin)片(pian)(pian)的技術(shu)(shu)，它的原理是利用(yong)(yong)高清晰度的光刻(ke)膠和鐳(lei)射光來(lai)(lai)進(jin)(jin)行芯(xin)片(pian)(pian)電路的圖(tu)案制造。這個過程需(xu)要一(yi)(yi)(yi)個***來(lai)(lai)進(jin)(jin)行。3.沉積(ji)(ji)金屬。制造芯(xin)片(pian)(pian)還(huan)需(xu)要沉積(ji)(ji)金屬，這一(yi)(yi)(yi)步(bu)(bu)驟主要是在(zai)晶(jing)圓(yuan)(yuan)表面涂(tu)上(shang)(shang)一(yi)(yi)(yi)層金屬，包括(kuo)銅、鎢等金屬。這個過程可(ke)以(yi)用(yong)(yong)物(wu)相沉積(ji)(ji)等技術(shu)(shu)來(lai)(lai)實現。中(zhong)清航(hang)科(ke)處理晶(jing)圓(yuan)(yuan)廠異常報告，技術(shu)(shu)爭(zheng)議(yi)解決成功率**。杭州中(zhong)芯(xin)國(guo)際(ji) 40nm流片(pian)(pian)代理

中(zhong)(zhong)清(qing)航科(ke)的(de)(de)流片(pian)(pian)(pian)代理(li)服(fu)務(wu)(wu)實(shi)現了全渠道服(fu)務(wu)(wu)支持，客(ke)(ke)(ke)戶可通(tong)(tong)過電話(hua)、郵(you)件、在(zai)線客(ke)(ke)(ke)服(fu)、移動端(duan)APP等多種渠道獲取服(fu)務(wu)(wu)。其(qi)(qi)客(ke)(ke)(ke)戶服(fu)務(wu)(wu)團隊(dui)實(shi)行(xing)7×24小(xiao)時值班(ban)制度(du)，確保客(ke)(ke)(ke)戶的(de)(de)問(wen)題(ti)能(neng)得(de)到及時響(xiang)應，普(pu)通(tong)(tong)問(wen)題(ti)1小(xiao)時內給出解決方案(an)，復雜(za)問(wen)題(ti)4小(xiao)時內成立專項(xiang)小(xiao)組處理(li)。通(tong)(tong)過客(ke)(ke)(ke)戶滿意度(du)調查(cha)，不斷優化服(fu)務(wu)(wu)流程與(yu)服(fu)務(wu)(wu)質量(liang)(liang)，客(ke)(ke)(ke)戶滿意度(du)持續保持在(zai)95%以(yi)上(shang)，重(zhong)復合作(zuo)(zuo)率達到80%。對于需要進(jin)行(xing)低(di)軌衛星芯(xin)片(pian)(pian)(pian)流片(pian)(pian)(pian)的(de)(de)客(ke)(ke)(ke)戶，中(zhong)(zhong)清(qing)航科(ke)提(ti)供抗(kang)輻(fu)射(she)(she)流片(pian)(pian)(pian)代理(li)服(fu)務(wu)(wu)。其(qi)(qi)與(yu)具(ju)備抗(kang)輻(fu)射(she)(she)工藝能(neng)力的(de)(de)晶圓(yuan)廠合作(zuo)(zuo)，熟悉總(zong)劑量(liang)(liang)輻(fu)射(she)(she)、單粒(li)子效應等空間環(huan)境對芯(xin)片(pian)(pian)(pian)的(de)(de)影響(xiang)，能(neng)為客(ke)(ke)(ke)戶提(ti)供抗(kang)輻(fu)射(she)(she)加固設計建議(yi)、工藝參數選(xuan)擇(ze)等專業服(fu)務(wu)(wu)。在(zai)流片(pian)(pian)(pian)過程中(zhong)(zhong)，實(shi)施(shi)特殊的(de)(de)工藝控制，如增加氧化層厚(hou)度(du)、采(cai)用特殊的(de)(de)摻雜(za)工藝等，提(ti)高芯(xin)片(pian)(pian)(pian)的(de)(de)抗(kang)輻(fu)射(she)(she)能(neng)力。已(yi)成功代理(li)多個(ge)低(di)軌衛星通(tong)(tong)信芯(xin)片(pian)(pian)(pian)的(de)(de)流片(pian)(pian)(pian)項(xiang)目(mu)，產(chan)品(pin)通(tong)(tong)過了嚴(yan)格的(de)(de)輻(fu)射(she)(she)測試，滿足衛星在(zai)軌運行(xing)10年以(yi)上(shang)的(de)(de)要求。衢(qu)州TSMC 110nm流片(pian)(pian)(pian)代理(li)選(xuan)擇(ze)中(zhong)(zhong)清(qing)航科(ke)流片(pian)(pian)(pian)代理(li)，享(xiang)受(shou)12家主流晶圓(yuan)廠優先產(chan)能(neng)配額。

以(yi)下(xia)優點：1.精(jing)度(du)(du)高(gao)(gao)。芯(xin)片(pian)(pian)流(liu)片(pian)(pian)技術(shu)的(de)(de)(de)(de)制(zhi)造(zao)精(jing)度(du)(du)非(fei)常高(gao)(gao)，可(ke)以(yi)達到亞微米級別的(de)(de)(de)(de)精(jing)度(du)(du)，因此(ci)可(ke)以(yi)制(zhi)造(zao)出(chu)更加精(jing)密、更穩定的(de)(de)(de)(de)電路(lu)。2.可(ke)擴(kuo)展性(xing)強(qiang)。芯(xin)片(pian)(pian)流(liu)片(pian)(pian)技術(shu)具有(you)很(hen)強(qiang)的(de)(de)(de)(de)可(ke)擴(kuo)展性(xing)，可(ke)以(yi)制(zhi)造(zao)出(chu)不(bu)同的(de)(de)(de)(de)芯(xin)片(pian)(pian)大(da)小、形態和(he)功能，在不(bu)同的(de)(de)(de)(de)應(ying)用(yong)領域中發揮作用(yong)。3.生(sheng)產效率高(gao)(gao)。芯(xin)片(pian)(pian)流(liu)片(pian)(pian)技術(shu)可(ke)以(yi)采用(yong)大(da)規(gui)模(mo)生(sheng)產方式，通(tong)過(guo)(guo)(guo)自動化生(sheng)產線(xian)，可(ke)以(yi)快速地、高(gao)(gao)效地完成(cheng)芯(xin)片(pian)(pian)制(zhi)造(zao)工(gong)作，從(cong)而提高(gao)(gao)生(sheng)產效率和(he)降造(zao)成(cheng)本。總結總而言之，芯(xin)片(pian)(pian)流(liu)片(pian)(pian)是芯(xin)片(pian)(pian)制(zhi)造(zao)的(de)(de)(de)(de)重要環(huan)節之一，它(ta)是將芯(xin)片(pian)(pian)設計圖轉(zhuan)換為(wei)實際(ji)芯(xin)片(pian)(pian)的(de)(de)(de)(de)過(guo)(guo)(guo)程。芯(xin)片(pian)(pian)流(liu)片(pian)(pian)技術(shu)的(de)(de)(de)(de)制(zhi)造(zao)流(liu)程非(fei)常復雜，需要經過(guo)(guo)(guo)多個步(bu)驟和(he)環(huan)節，以(yi)確保芯(xin)片(pian)(pian)制(zhi)造(zao)的(de)(de)(de)(de)精(jing)度(du)(du)、質量(liang)和(he)穩定性(xing)。芯(xin)片(pian)(pian)流(liu)片(pian)(pian)技術(shu)作為(wei)一種高(gao)(gao)新技術(shu)，具有(you)很(hen)強(qiang)的(de)(de)(de)(de)可(ke)擴(kuo)展性(xing)和(he)生(sheng)產效率，有(you)著廣(guang)泛的(de)(de)(de)(de)應(ying)用(yong)前(qian)景。

成(cheng)(cheng)本(ben)(ben)(ben)控制(zhi)(zhi)是(shi)流(liu)片(pian)(pian)代理服務的核(he)心競(jing)爭力之一(yi)，中(zhong)清(qing)航科通過規模效(xiao)應與(yu)(yu)技術優(you)化實現成(cheng)(cheng)本(ben)(ben)(ben)精確(que)管控。其(qi)整合行(xing)業內800余家設計(ji)公司的流(liu)片(pian)(pian)需求(qiu)，形成(cheng)(cheng)規模化采購優(you)勢，單批(pi)(pi)次(ci)流(liu)片(pian)(pian)成(cheng)(cheng)本(ben)(ben)(ben)較企業單獨采購降(jiang)低18%-25%。在(zai)掩膜版(ban)制(zhi)(zhi)作(zuo)環節，中(zhong)清(qing)航科與(yu)(yu)全球掩膜廠合作(zuo)開發共(gong)享掩膜方案，將中(zhong)小客戶的掩膜成(cheng)(cheng)本(ben)(ben)(ben)分攤(tan)降(jiang)低60%以(yi)上(shang)(shang)。對于試產階段的小批(pi)(pi)量流(liu)片(pian)(pian)，推出多(duo)項(xiang)目晶(jing)圓（MPW）拼片(pian)(pian)服務，支持同(tong)一(yi)晶(jing)圓上(shang)(shang)集成(cheng)(cheng)20-50個不同(tong)設計(ji)方案，使(shi)客戶的首輪流(liu)片(pian)(pian)成(cheng)(cheng)本(ben)(ben)(ben)控制(zhi)(zhi)在(zai)10萬元以(yi)內。此外(wai)，其(qi)成(cheng)(cheng)本(ben)(ben)(ben)核(he)算團隊(dui)會(hui)為每個項(xiang)目提供詳(xiang)細的成(cheng)(cheng)本(ben)(ben)(ben)分析報(bao)告，明確(que)各(ge)項(xiang)費用(yong)構成(cheng)(cheng)，并給(gei)出成(cheng)(cheng)本(ben)(ben)(ben)優(you)化建議，幫助(zhu)客戶在(zai)保證(zheng)質量的前提下實現效(xiao)益較大(da)化。中(zhong)清(qing)航科同(tong)步獲取5家報(bao)價，流(liu)片(pian)(pian)成(cheng)(cheng)本(ben)(ben)(ben)平(ping)均降(jiang)低22%。

中清(qing)航(hang)(hang)科(ke)注(zhu)重為客戶提(ti)供(gong)持(chi)(chi)續的技術支(zhi)持(chi)(chi)，即使流片(pian)(pian)完成(cheng)后(hou)仍保留1年的技術服(fu)務期。客戶在芯(xin)片(pian)(pian)測試或應用過(guo)程(cheng)中遇到(dao)與流片(pian)(pian)相(xiang)關的問題(ti)，技術團隊(dui)會提(ti)供(gong)分析(xi)支(zhi)持(chi)(chi)，如協助(zhu)排查(cha)工藝導致的性(xing)能偏(pian)差、提(ti)供(gong)二次流片(pian)(pian)的優化建議等。去年某AI芯(xin)片(pian)(pian)客戶量產時出(chu)現良(liang)率波(bo)動，其(qi)技術團隊(dui)通(tong)過(guo)回溯流片(pian)(pian)數據，3天內找(zhao)到(dao)光刻參數偏(pian)差原(yuan)因，幫(bang)助(zhu)客戶恢復(fu)正(zheng)常生(sheng)產。在流片(pian)(pian)成(cheng)本透明化方面(mian)，中清(qing)航(hang)(hang)科(ke)實(shi)行“陽光報價”機制，所(suo)有費(fei)用明細(xi)清(qing)晰可(ke)查(cha)，包含晶圓代工費(fei)、掩膜版費(fei)、測試費(fei)等，無隱藏收費(fei)項(xiang)目。客戶可(ke)通(tong)過(guo)在線報價系(xi)統(tong)實(shi)時獲取不同工藝節點、不同晶圓廠的參考報價，系(xi)統(tong)會根(gen)據客戶需(xu)求自動生(sheng)成(cheng)成(cheng)本構成(cheng)分析(xi)。其(qi)定期發布的《流片(pian)(pian)成(cheng)本白皮書》，還為行業提(ti)供(gong)客觀的價格趨勢參考。中清(qing)航(hang)(hang)科(ke)高校流片(pian)(pian)計劃，教育機構專享(xiang)MPW補(bu)貼30%。衢州TSMC 110nm流片(pian)(pian)代理

中清(qing)航科代持晶圓廠賬(zhang)戶(hu)，規避敏感(gan)技術泄露風險。杭州中芯國際 40nm流片代理

流(liu)(liu)片(pian)(pian)(pian)(pian)代理(li)(li)服務(wu)(wu)中(zhong)的(de)**布局(ju)支(zhi)持是(shi)中(zhong)清航(hang)科的(de)特(te)色(se)服務(wu)(wu)之一。其知識(shi)產權團隊會在(zai)(zai)流(liu)(liu)片(pian)(pian)(pian)(pian)前對(dui)客(ke)(ke)戶(hu)(hu)(hu)(hu)的(de)設(she)(she)計方(fang)案進(jin)行**檢索與分析(xi)，識(shi)別潛(qian)在(zai)(zai)的(de)**侵權風(feng)險，并提(ti)供規避設(she)(she)計建議(yi)；流(liu)(liu)片(pian)(pian)(pian)(pian)完成(cheng)(cheng)后，協(xie)助客(ke)(ke)戶(hu)(hu)(hu)(hu)整理(li)(li)流(liu)(liu)片(pian)(pian)(pian)(pian)過程中(zhong)的(de)技術創(chuang)新點，提(ti)供**申(shen)請策略建議(yi)。通(tong)(tong)過該服務(wu)(wu)，客(ke)(ke)戶(hu)(hu)(hu)(hu)的(de)**申(shen)請通(tong)(tong)過率提(ti)升(sheng)35%，**侵權風(feng)險降(jiang)低60%，某AI芯(xin)(xin)片(pian)(pian)(pian)(pian)客(ke)(ke)戶(hu)(hu)(hu)(hu)在(zai)(zai)其幫(bang)助下(xia)，成(cheng)(cheng)功申(shen)請了15項(xiang)流(liu)(liu)片(pian)(pian)(pian)(pian)相關的(de)發明**。針對(dui)較低功耗(hao)(hao)芯(xin)(xin)片(pian)(pian)(pian)(pian)的(de)流(liu)(liu)片(pian)(pian)(pian)(pian)需求，中(zhong)清航(hang)科開發了專項(xiang)工藝優化(hua)方(fang)案。通(tong)(tong)過與晶圓廠合(he)作調整摻雜濃度(du)、優化(hua)柵氧厚度(du)等工藝參數，幫(bang)助客(ke)(ke)戶(hu)(hu)(hu)(hu)降(jiang)低芯(xin)(xin)片(pian)(pian)(pian)(pian)的(de)靜態(tai)功耗(hao)(hao)與動態(tai)功耗(hao)(hao)。引入較低功耗(hao)(hao)測(ce)試(shi)系統，能(neng)精(jing)確(que)測(ce)量芯(xin)(xin)片(pian)(pian)(pian)(pian)在(zai)(zai)不同工作模(mo)式下(xia)的(de)功耗(hao)(hao)特(te)性，電(dian)流(liu)(liu)測(ce)量精(jing)度(du)達到10pA。已成(cheng)(cheng)功代理(li)(li)多個物聯網(wang)較低功耗(hao)(hao)芯(xin)(xin)片(pian)(pian)(pian)(pian)的(de)流(liu)(liu)片(pian)(pian)(pian)(pian)項(xiang)目，使(shi)產品的(de)待(dai)機(ji)電(dian)流(liu)(liu)降(jiang)低至100nA以下(xia)，續航(hang)能(neng)力提(ti)升(sheng)50%。杭州中(zhong)芯(xin)(xin)國(guo)際 40nm流(liu)(liu)片(pian)(pian)(pian)(pian)代理(li)(li)